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http://cimav.repositorioinstitucional.mx/jspui/handle/1004/1380| XAS and TEM Study of the TiN Thin Films Grown by the pulsed DC sputtering Technique assisted by balanced magnetron. | |
| JOSE ALBERTO DUARTE MOLLER HILDA ESPERANZA ESPARZA PONCE | |
| Acceso Abierto | |
| Sin Derechos Reservados | |
| XAS | |
| Hard coatings and their applications continuously are in progress. The thin films of transition metal nitrides have a broad range of potential applications that goes from microelectronics to the metal-mechanics industry or in biological implants. The research of TiN is still on in actuality for the different science branches like the above mentioned [1]. In this work a serie of different TiNx thin films were grown by the DC-sputtering technique. The purpose was to study through XAS and TEM interpretation, how the different amounts of N2 during growing thin TiN thin films affects the stoichiometry of the TiN deposited.. Also the results obtained determinate how to interpret the spectra to see the different valences of Ti in TiN, are working. The results were supported with the EXAFS, XANES and TEM analysis. This work concludes the adequated conditions for this experiment to obtain TiN as thin film by the DC sputtering assited by balanced magnetron at room temperature and aconcludes which XAS spectra are the finger print for valences of Ti. | |
| 2006 | |
| Memoria de congreso | |
| Inglés | |
| OTRAS | |
| Versión revisada | |
| submittedVersion - Versión revisada | |
| Aparece en las colecciones: | Artículos de Congresos |
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|---|---|---|---|
| XAS and TEM.pdf | 170.37 kB | Adobe PDF | Visualizar/Abrir |