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http://cimav.repositorioinstitucional.mx/jspui/handle/1004/1670| Annealing effect on the structural and optical properties of siox films deposited by HFCVD | |
| José Alberto Luna López SILVIA ADRIANA PEREZ GARCIA | |
| Acceso Abierto | |
| Sin Derechos Reservados | |
| SiOx Photoluminiscence XPS | |
| Non-stroichoimetric silicon oxide (SiOx) with embedded Si nanoparticles (Si-nps) shows novel physical characteristic, which permits its use in optoelectronic devices as photodetectors and ligh emitters. In this work, a detailed analysis of the structural and optical properties of silicon rich oxide films deposited via hot filament chemical vapor deposition is done. | |
| 2014 | |
| Memoria de congreso | |
| Inglés | |
| OTRAS | |
| Versión revisada | |
| submittedVersion - Versión revisada | |
| Aparece en las colecciones: | Artículos de Congresos |
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| Fichero | Tamaño | Formato | |
|---|---|---|---|
| 8th International Conference on Sensing Technology.pdf | 3.58 MB | Adobe PDF | Visualizar/Abrir |