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http://cimav.repositorioinstitucional.mx/jspui/handle/1004/1868| Evaluation and Characterization of Thin Films on AISI 9840 by Electrochemical Noise | |
| CLAUDIA PATRICIA CASTILLO MORQUECHO HILDA ESPERANZA ESPARZA PONCE JOSE ALBERTO DUARTE MOLLER VICTOR MANUEL OROZCO CARMONA CITLALI GAONA TIBURCIO FACUNDO ALMERAYA CALDERON ALBERTO MARTINEZ VILLAFAÑE | |
| Acceso Abierto | |
| Sin Derechos Reservados | |
| Thin films Aluminum | |
| Recently researches have been focusing on thin films by sputtering processes deposited on different substrates. Metallic thin films may be formed by a single nanolayer, bilayers or multilayers structures to combine properties of different materials, also to create specific properties of the structure, especially when it has nanometer scale dimensions. The objective of this study was to optimize the deposition conditions and the characterization of bilayers of Al/Cr, Cr/Al, on substrates of steel alloys, in order to evaluate their performance under corrosive conditions. Two configurations were designed for Al and Cr, deposited by a sputtering system V3 with a magnetron, used a pulsed DC source on AISI 9840 steel substrates, the power was 50W, to constant temperature 150 ° C, with Argon flow of 5.8 sccm, deposition time was 15 minutes for each layer. Microstructural characterization of the bilayers was performed by X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM) and atomic force microscopy (AFM). Electrochemical potential noise was evaluated by potentiostat Solartron 1285, programmed data processor CorrWare. The bilayers were adherents and the configuration Al/Cr was more resistant to corrosion. | |
| 2015 | |
| Artículo | |
| Inglés | |
| OTRAS | |
| Versión revisada | |
| submittedVersion - Versión revisada | |
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| J Elec Soc.pdf | 447.3 kB | Adobe PDF | Visualizar/Abrir |